... the other way.

ECOPLATER COPPER COMPACT E, EC

COPPER PLATING TANK FOR ROTOGRAVURE CYLINDERS

1. -Compact design, low overall height
   

2. -Simple operation by GALVACONTROL
   

3. -Flexible cylinder holding device with ECOCLAMP or modular adapter system
   

4. -Can be integrated into automatic production line

PATENTED ELECTROLYTE FLOW

1. -Symmetrical flow of electrolyte
   

2. -Controlled transport of anode sludge away from cylinder
   

3. -Optimal anode geometry

ECOPLATER produces fine crystalline hard copper layers, which are ideal conditions for the electronic engraver. This state-of-the-art machinery is based on the latest innovations in gravure cylinder copper plating. In addition, the machinery has many economical aspects, such as:

- Defined  layer purity and surface quality result in low diamond wear, thereby keeping production costs low

- Efficient current transfer results in consistent layer thickness

- Low energy consumption cut production costs

ANODE SHAPE

1. -Concentric anode shape
   

2. -Precise electrolyte flow
   

ANODE ADJUSTMENT

1. -Concentric automatic anode adjustment
   

2. -Optimized current flow towards cylinder
   

ANODE BASKETS

1. -Titanium anode baskets
   

2. -Symmetrical overflow of electrolyte
   

3. -360° electrolyteoverfolw return
   

ECOCLAMP

1. -Lightweight cylinder holder
   

2. -Internal drive wheel and current transfer are bulidt into the machine
   

3. -Simple design with easy fit
   

GALVACONTROL

1. -PLC electronics with interface to remote control
   

2. -Fully automatic process or manual operation
   

3. -Adjustable production parameters
   

ADAPTER

1. -Weight saving construction
   

2. -Modular design
   

Plating time:

Current density:

Immersion:

Electrolyte temperature:

Copper hardness

Plating thickness tolerance:

Electrolyte filtration rate:

100 µm layer in 30 - 32 minutes

30 A/dm²

50 % of cylinder surface

30-34 °C ± 1,5 °C

HV 0,1 180-220 ±2,5 HV (with additive)

for 100 µm layer ± 3%

approx. 15 times per hour

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